Electrodeposition of Chromium Film Using Cr3+ Solution: Fundamental Study of Crack Formation
| dc.contributor.author | Ahmadi, Kamyar | |
| dc.contributor.author | Brankovic, Stanko R. | |
| dc.date.accessioned | 2018-02-23T19:36:21Z | |
| dc.date.available | 2018-02-23T19:36:21Z | |
| dc.date.issued | 2017 | |
| dc.description.abstract | What is the purpose of this study? Understand issues with electrodeposition (ELD) of chromium (Cr) film from Cr3+ solution and then suggest an approach to address them. What is ELD? In ELD process by applying current metallic ions in solution reduce and form a metallic coating on the surface of an electrode. Why Cr? Cr has attractive appearance -> decorative application. Cr is hard and anti-corrosion -> engineering application. General approaches for ELD of Cr? Cr(IV) ions -> + high quality films, - highly carcinogenic. Cr(III) ions -> + environmentally friendly, - issues with quality due to crack formation. What have we done so far? We fundamentally study the origin of cracks in the films. We propose a promising approach to reduce the cracking. | |
| dc.description.department | Electrical and Computer Engineering, Department of | |
| dc.identifier.uri | http://hdl.handle.net/10657/2313 | |
| dc.language.iso | en_US | |
| dc.title | Electrodeposition of Chromium Film Using Cr3+ Solution: Fundamental Study of Crack Formation | |
| dc.type | Poster |