In-Situ Stress Measurements During Electrodeposition of Chromium Films

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dc.contributor.committeeMemberBrankovic, Stanko R.
dc.contributor.committeeMemberRuchhoeft, Paul
dc.contributor.committeeMemberRobles Hernandez, Francisco C.
dc.creatorKaradavut, Omerfaruk
dc.creator.orcid0000-0001-7956-0489
dc.date.accessioned2020-01-07T03:33:32Z
dc.date.createdDecember 2018
dc.date.issued2018-12
dc.date.submittedDecember 2018
dc.date.updated2020-01-07T03:33:32Z
dc.description.abstractChromium is widely used in many decorative and engineering applications. Recently, solution based on Cr3+ as environment-friendly bath has attracted interests for chromium deposition. However, Chromium thin film deposited from Cr+3 forms cracks, which causes reliability problems. Earlier incorporation of chromium hydride during the growth and its decomposition after the deposition have been realized as the causes of the cracks. Thus, pulse current deposition approach with periodic “on” and “off” time proposed as a solution. In our study, we focus on the stress evolution of chromium film deposited with various parameters to find pulse current function that effectively removes hydride from the film. Our results showed hydride removal occurs at “off” time which is 27 times longer than “on” time, which is not practical in industry. We have found effective hydride removal happens in a cycle with Xs “on” time and 7Xs “off” time where X is more than 1s.
dc.description.departmentElectrical and Computer Engineering, Department of
dc.format.digitalOriginborn digital
dc.format.mimetypeapplication/pdf
dc.identifier.urihttps://hdl.handle.net/10657/5822
dc.language.isoeng
dc.rightsThe author of this work is the copyright owner. UH Libraries and the Texas Digital Library have their permission to store and provide access to this work. Further transmission, reproduction, or presentation of this work is prohibited except with permission of the author(s).
dc.subjectThin films
dc.subjectChromium
dc.subjectElectrodeposition
dc.subjectStress
dc.titleIn-Situ Stress Measurements During Electrodeposition of Chromium Films
dc.type.dcmiText
dc.type.genreThesis
local.embargo.lift2020-12-01
local.embargo.terms2020-12-01
thesis.degree.collegeCullen College of Engineering
thesis.degree.departmentElectrical and Computer Engineering, Department of
thesis.degree.disciplineElectrical Engineering
thesis.degree.grantorUniversity of Houston
thesis.degree.levelMasters
thesis.degree.nameMaster of Science in Electrical Engineering

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