EPITAXIAL GROWTH OF THIN FILMS BY PHYSICAL VAPOR DEPOSITION

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dc.contributor.advisorSelvamanickam, Venkat
dc.contributor.committeeMemberRyou, Jae-Hyun
dc.contributor.committeeMemberMeen, James K.
dc.contributor.committeeMemberLi, Sun
dc.contributor.committeeMemberArdebili, Haleh
dc.creatorZhang, Chuanze
dc.creator.orcid0000-0002-5714-9768
dc.date.accessioned2023-05-28T18:54:46Z
dc.date.createdDecember 2022
dc.date.issued2022-12-15
dc.date.updated2023-05-28T18:54:47Z
dc.description.abstractPhysical vapor deposition (PVD), including magnetron sputtering deposition and ion beam assisted deposition (IBAD) have been used for epitaxial growth of single-crystal-like, biaxially-textured thin films on various substrates with good texture. These thin films are used for the fabrication of semiconductor/superconductor devices on flexible metal substrates for good electrical properties, or as coatings on cutting tools for high hardness and abrasion resistance. In this dissertation, epitaxial TiN(200) thin film has been demonstrated on flexible metal substrates, and on tungsten carbide cobalt tool bits. Additionally, TiN(111) epitaxial growth has been shown on these substrates. High dielectric constant inorganic perovskite materials, such as strontium titanate (SiTrO3) have been epitaxially grown on flexible metal substrates with TiN(200) and LaMnO3(200) intermediate layers. Different structures of electrically-conductive oxide buffers have been studied for epitaxial growth of the rare-earth barium copper oxide superconductor thin film. Epitaxial growth of ultra-high bandgap material, gallium oxide (Ga2O3) has been demonstrated with good quality texture on MgO(200)-based flexible metal substrate by magnetron sputtering. Additionally, epitaxial Si-doped Ga2O3 thin films with better texture quality have been shown on flexible metal substrates.
dc.description.departmentMechanical Engineering, Department of
dc.format.digitalOriginborn digital
dc.format.mimetypeapplication/pdf
dc.identifier.urihttps://hdl.handle.net/10657/14348
dc.language.isoeng
dc.rightsThe author of this work is the copyright owner. UH Libraries and the Texas Digital Library have their permission to store and provide access to this work. Further transmission, reproduction, or presentation of this work is prohibited except with permission of the author(s).
dc.subjectPVD
dc.subjectIBAD
dc.subjectEpitaxil Growth
dc.subjectThin films
dc.subjectTiN
dc.subjectInorganic Perovskite
dc.subjectGa2O3
dc.titleEPITAXIAL GROWTH OF THIN FILMS BY PHYSICAL VAPOR DEPOSITION
dc.type.dcmiText
dc.type.genreThesis
dcterms.accessRightsThe full text of this item is not available at this time because the student has placed this item under an embargo for a period of time. The Libraries are not authorized to provide a copy of this work during the embargo period.
local.embargo.lift2024-12-01
local.embargo.terms2024-12-01
thesis.degree.collegeCullen College of Engineering
thesis.degree.departmentMechanical Engineering, Department of
thesis.degree.disciplineMechanical Engineering
thesis.degree.grantorUniversity of Houston
thesis.degree.levelDoctoral
thesis.degree.nameDoctor of Philosophy

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