Measuring Deprotection Kinetics in Chemically Amplified Resists with In-Situ Infrared Spectroscopy

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dc.contributor.advisorStein, Gila E.
dc.contributor.committeeMemberHarold, Michael P.
dc.contributor.committeeMemberWolfe, John C.
dc.creatorLahoti, Minnie
dc.date.accessioned2018-07-10T18:46:47Z
dc.date.available2018-07-10T18:46:47Z
dc.date.createdMay 2016
dc.date.issued2016-05
dc.date.submittedMay 2016
dc.date.updated2018-07-10T18:46:48Z
dc.description.abstractChemically amplified photoresists have been used in semiconductor lithography for over 40 years. These materials are based on an acid-sensitive polymer containing a low concentration of a strong acid catalyst. Patterns are formed in the polymer through a coupled reaction-diffusion process. The diffusion length of the acid catalyst may control the pattern dimensions, which is a significant challenge for future manufacturing processes that need to resolve features at the scale of 10 nm. The goal of this project is to develop predictive models of pattern formation using a model photoresist system. First, reaction kinetics was measured with in-situ infrared absorbance spectroscopy as a function of temperature (below the glass transition temperature), acid catalyst concentration, and acid-anion size. These data demonstrate that a smaller acid-anion pair leads to faster reactions. Second, conversion kinetics was analyzed with a simple model of reaction with slow catalyst loss. The model qualitatively captures the observed trends and suggests an activation energy on the order of 100 kJ/mol for each catalyst/polymer system, which is the magnitude expected for a diffusion-controlled reaction in a glassy polymer. Collectively, these outcomes demonstrate that pattern formation in chemically amplified photoresists is largely controlled by acid catalyst diffusion.  
dc.description.departmentChemical and Biomolecular Engineering, Department of
dc.format.digitalOriginborn digital
dc.format.mimetypeapplication/pdf
dc.identifier.urihttp://hdl.handle.net/10657/3175
dc.language.isoeng
dc.rightsThe author of this work is the copyright owner. UH Libraries and the Texas Digital Library have their permission to store and provide access to this work. Further transmission, reproduction, or presentation of this work is prohibited except with permission of the author(s).
dc.subjectDeprotection
dc.subjectKinetics
dc.subjectChemistry
dc.subjectAmplified
dc.subjectPhotoresists
dc.subjectResistance
dc.subjectReactions
dc.subjectModel
dc.subjectInfrared
dc.subjectSpectroscopy
dc.subjectFTIR
dc.titleMeasuring Deprotection Kinetics in Chemically Amplified Resists with In-Situ Infrared Spectroscopy
dc.type.dcmiText
dc.type.genreThesis
thesis.degree.collegeCullen College of Engineering
thesis.degree.departmentChemical and Biomolecular Engineering, Department of
thesis.degree.disciplineChemical Engineering
thesis.degree.grantorUniversity of Houston
thesis.degree.levelMasters
thesis.degree.nameMaster of Science

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