Characterization of Amorphous Carbon Films for Mask Protection during Ion Beam Bombardment

dc.contributor.advisorWolfe, John C.
dc.contributor.committeeMemberShih, Wei-Chuan
dc.contributor.committeeMemberWood, Lowell T.
dc.creatorKusko, Rebecca Elizabeth
dc.creator.orcid0000-0001-5331-5119
dc.date.accessioned2019-09-13T20:32:59Z
dc.date.available2019-09-13T20:32:59Z
dc.date.createdMay 2017
dc.date.issued2017-05
dc.date.submittedMay 2017
dc.date.updated2019-09-13T20:33:01Z
dc.description.abstractThe field of lithography is in simplest terms the use of a beam, incident on a mask, to transfer the mask pattern onto the substrate. This process is utilized by every semiconductor company to create the microchips, which make modern life possible. Though photons are the industry standard, atom/ion beam lithography is a specific niche wherein atoms or ions are used to transfer a mask pattern. Although this technique grants excellent flexibility as far as depth of field and diffraction limit, the use of massive particles causes mask damage, limiting commercial applications of the method. To address this problem, we refine a process to coat masks with diamond-like carbon (DLC) to protect them from ion bombardment. This continues the work of Wasson, Hudek, Nounu, and Abichandani, who pioneered deposition techniques to create amorphous carbon films with low initial compressive stress, which remains constant to very high ion doses. In particular, Nounu and Abichandani’s coating technique is repeated but more fully characterized, refined to eliminate the effects of mask charging, and improved with respect to radiation resistance. Further stress measurements are taken, with particular emphasis on in-situ, in vacuum measurements of film response to ion bombardment.
dc.description.departmentElectrical and Computer Engineering, Department of
dc.format.digitalOriginborn digital
dc.format.mimetypeapplication/pdf
dc.identifier.urihttps://hdl.handle.net/10657/4529
dc.language.isoeng
dc.rightsThe author of this work is the copyright owner. UH Libraries and the Texas Digital Library have their permission to store and provide access to this work. Further transmission, reproduction, or presentation of this work is prohibited except with permission of the author(s).
dc.subjectAmorphous carbon
dc.subjectDLC
dc.subjectCarbon films
dc.subjectPolymers
dc.subjectMask protection
dc.subjectIon beam
dc.subjectIon dose
dc.subjectRadiation
dc.subjectStress
dc.subjectMMA
dc.subjectMethyl methacrylate
dc.subjectCVD
dc.subjectAnnealing
dc.titleCharacterization of Amorphous Carbon Films for Mask Protection during Ion Beam Bombardment
dc.type.dcmiText
dc.type.genreThesis
thesis.degree.collegeCullen College of Engineering
thesis.degree.departmentElectrical and Computer Engineering, Department of
thesis.degree.disciplineElectrical Engineering
thesis.degree.grantorUniversity of Houston
thesis.degree.levelMasters
thesis.degree.nameMaster of Science in Electrical Engineering

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